This project is to design a small thin film deposition reactor that is optimized for rapid and flexible screening
of chemical precursors. Specifically, for thin films deposited using atomic layer deposition where 2 precursors
(A and B) are exposed to the substrate in an alternate fashion (A then B then A then B …), the film of
interest is built up layer by layer. The precursors must be prevented from simultaneously being in the reactor
as they are by design very reactive toward each other and can damage equipment and in extreme cases
personnel if they are allowed to meet in the gas phase. On the other hand, rapid screening is desired so the
precursors need to be introduced into the reactor in quick succession. For these reasons, electronic control over
the precursor valves is required.
